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일시: 5월 7일 목요일 오후 4시

장소: 310관 315호

제목:  Photolithography: Basics & Advanced Technologies

연사: Dr. Dong Sung Kim (Scanner Group Lead, NXP Semiconductors, Austin, Texas, US)

학부생, 대학원생 모두 참석 가능하오니 많은 참여 바랍니다.

[Seminar Abstract] Photolithography: Basics & Advanced Technologies

Speaker: Dr. Dong Sung Kim (Scanner Group Lead, NXP Semiconductors, Austin, Texas, US)

This seminar provides an in-depth exploration of Photolithography, the cornerstone of modern semiconductor manufacturing and the decisive factor in micro-processing limits. As the era of autonomous driving and Electric Vehicles (EVs) arrives, the number of semiconductors per vehicle is surging to over 3,000 units. In this context, we highlight the critical importance of  lithography technology in producing reliable and high-performance semiconductors, alongside key examples of technological innovation.

In the first part of the lecture, we will examine the process flow of lithography in detail. 

Furthermore, we will explain the optical mechanisms used to control the three key performance indicators that determine process quality: Resolution, Critical Dimension (CD), and Overlay accuracy.

The subsequent section introduces the architecture of Scanner and Track in-line systems used in high-volume manufacturing (HVM). We will focus specifically on Extreme Ultraviolet (EUV) lithography, the industry's "game-changer," discussing the principles of 13.5nm wavelength light source generation and the latest trends in ASML’s next-generation equipment designed to achieve resolutions below 8nm. This seminar aims to provide semiconductor process engineers and researchers with technical insights ranging from fundamental theories to cuttingedge mass-production technologies.

[Key Learning Objectives]

• Introduction to automotive semiconductor market trends and manufacturing networks.

• Detailed understanding of the 8-step photolithography process.

• Optimization strategies for lithography performance metrics (Resolution, CD, and Overlay).

• Technical analysis of ArF Immersion and next-generation EUV (Extreme Ultraviolet) technologies.

• Industrial scanner system architecture and methods for mass-production efficiency.

[Keywords] Photolithography, Automotive Semiconductors, EUV (Extreme Ultraviolet), CD Control, Overlay Accuracy, ASML, Scanner Systems